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ASML reports on progress in EUV

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 ASML reports on progress in EUV

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Recently at the reporting conference, representatives of ASML company  - Dutch manufacturer of production equipment for the production of semiconductors - have reported progress in the development, improvement and production scanners for use with 13.5-nm radiation or EUV.  In reality, the mass production of EUV-using scanners promises to begin in 2020 with the practical development of a 5-nm technology standards.  In fact, the use of EUV-scanners will begin earlier, but it can not be called a mass.

ASML company expects to release memory with the norms of 15-10 nm EUV scanners will handle two or more layers.  With the release of processors with rules 7 or 5 nm EUV scanners can handle 6-9-critical layers.

Only in the second quarter  this year, ASML has received four applications for EUV scanner and still expects to sell at least 12 units in 2017.  In 2018 the volume of orders shall be at least 24 EUV scanners per year.

So far, everything depends on the relatively weak radiation sources.  Today, in the laboratory ASML EUV scanners develop power 210 watts.  To start the mass production using EUV-lithography source of power shall not be less than 250 watts.  Modern EUV-installation of radiation sources are supplied with only 125 watts.  Power 125 W is sufficient for processing 85 wafers per hour, while a 250-watt power can handle per hour up to 125 plates.

Also, the problem remains the duration of continuous operation EUV-systems, although there is progress.  Until recently, EUV scanners could operate only 80% of the time.  Improving plants helped raise while using scanners up to 90% of the time and even higher.  And work to improve the scanners continue.  The company said that the use of EUV-systems equaled at cost with a projection of 193-nm laser with a triple projection.  In other words,  EUV scanners might be beneficial even for the production of 10-nanometer chips for the release of which by conventional means requires three or four mask on one layer.  

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 ASML reports on progress in EUV

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Related news:

ASML starts commercial delivery of EUV-scanners (2017-09-07)
EUV-equipment ASML is ready for use in mass production (2017-07-21)
Nikon accused ASML and Carl Zeiss of infringing patents (2017-04-25)
ASML notes increased interest in EUV-scanners (2017-04-21)
In the fourth quarter, ASML increased its order backlog by 6 EUV-scanners (2017-01-19)
ASML will invest 2 billion in EUV-scanners next generation (2016-11-05)
Demand for the 10-nm lithography equipment ASML increased revenue (2016-10-20)
ASML reported the timing of EUV-lithography introduction in the manufacture of memory (2016-10-20)
Samsung will sell half of its stake in ASML Holding (2016-09-08)
FTC Taiwanese ASML Commission gave the green light to buy Hermes Microvision Company (2016-08-28)
ASML reports on progress in EUV (2016-07-24)
ASML buys Hermes Microvision (2016-06-17)
ASML belive in EUV-lithography performance (2016-04-13)
ASML will start to ship the equipment for the production of 10-nanometer chips in the second quarter (2016-01-21)
ASML has received from the American client order for 15 EUV-scanners (2015-04-24)
TSMC has proved that the new EUV-scanners ASML NXE 3300B can work with decent speed (2015-03-01)
TSMC will sell its stake in ASML (2015-01-17)
ASML agitating manufacturers DRAM-memory transition to EUV-lithography (2014-10-19)
ASML company will start supplying EUV-scanners for 10-nm-making in mid-2015 (2014-10-16)
ASML for the production of 7-nm semiconductor advantageous to use EUV-scanners (2014-09-18)

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