Yesterday, GlobalFoundries has released a lengthy press release under the title Accelerating adaptation LPM 20 nm and 14-nm-XM FinFET processes. The document was unusually large.
The company plans to start trial production of 20-nm semiconductor before the end of this year and begin production of an experienced 14-nm-making in 2014. This Schedule seems so weird , Thus, GlobalFoundries could catch up, or at least closer to Intel manufacturability production .
There was three pages to load list of compatible software tools and methodologies for companies Cadence Design Systems, Mentor Graphics and Synopsys, used to create the design and verification of semiconductors. And now a brief report that GlobalFoundries has produced digital semiconductor design patterns applied to 20-nm LPM and 14-nm-XM FinFET process technology with support for all major software applications and leading development companies. Also available a set (package) for developers, which can be downloaded from the site for the study GlobalFoundries together with the reference scenarios.
One interesting point is a question of compliance with the stated technical processes of production technology chain with mixed analog-digital architecture (analog / mixed signal, AMS). This means that in a fabrication process using double later - triple projection can produce complex solutions that combine, for example, RF and digital components. Intel is also going for it.